<meter id="pryje"><nav id="pryje"><delect id="pryje"></delect></nav></meter>
          <label id="pryje"></label>

          新聞中心

          EEPW首頁 > 電源與新能源 > 設(shè)計(jì)應(yīng)用 > 磁控濺射法沉積TCO薄膜的電源技術(shù)

          磁控濺射法沉積TCO薄膜的電源技術(shù)

          作者: 時(shí)間:2012-09-17 來源:網(wǎng)絡(luò) 收藏

          [18] Helmersson U, Lattemann M, Bohlmark J. Ionized physical vapor deposition (IPVD):

          A review of technology and applications [J]. Thin Solid Films, 2006, 513(1):1~24.

          [19] Christie D.J, Tomasel F., Sproul W.D. Power supply with arc handling for

          high peak power magnetron sputtering [J].Journal of Vacuum Science Technology A: Vacuum,

          Surfaces, and Films, 2004, 22(4):1415~1420.

          [20] Ganciu M, Konstantinidis S, Paint Y. Preionised pulsed magnetron discharges for

          ionised physical vapour deposition [J]. Journal of Optoelectronics and Advanced Materials,

          2005, 7(5):2481~2484.

          [21] Musil J, Lestina J, Vlcek J. Pulsed dc magnetron discharge for highrate sputtering

          of thin films [J]. Journal of Vacuum Science Technology A: Vacuum, Surfaces, and Films,

          2001, 19(2): 420~424.

          [22] Sittinger V, Ruske F, Werner W. High power pulsed magnetron sputtering of transparent

          conducting oxides [J]. Thin Solid Films, 2008, 516(17): 5847~5859.■

          dc相關(guān)文章:dc是什么



          上一頁 1 2 3 4 下一頁

          評論


          相關(guān)推薦

          技術(shù)專區(qū)

          關(guān)閉
          看屁屁www成人影院,亚洲人妻成人图片,亚洲精品成人午夜在线,日韩在线 欧美成人 (function(){ var bp = document.createElement('script'); var curProtocol = window.location.protocol.split(':')[0]; if (curProtocol === 'https') { bp.src = 'https://zz.bdstatic.com/linksubmit/push.js'; } else { bp.src = 'http://push.zhanzhang.baidu.com/push.js'; } var s = document.getElementsByTagName("script")[0]; s.parentNode.insertBefore(bp, s); })();